INFRACORP WATER

Ultrapure Water (UPW) – Core Overview

INFRACORP provides end-to-end UPW engineering, production, anddistributionsystems designed for industries that demand uncompromising purity, reliability, and process stability. Our solutions integrate advanced pretreatment, membrane separation, polishing, real-time monitoring, and ultra-high-purity distribution loops with materials and layouts optimized for contamination control.INFRACORP’s UPW capabilities include:

  • Semiconductor-grade UPW production meeting ASTM D5127 and SEMI F63 standards
  • High-efficiency multi-stage purification, including RO, EDI, ion exchange, UV TOC reduction, and sub-micron filtration
  • Continuous, real-time monitoring for resistivity, TOC, silica, microbial load, and dissolved oxygen
  • Ultra-pure distribution loop design (PVDF/PFA, sanitary welding, high-flow low-shear design)
  • Point-of-use polishing units ensuring stable purity where it matters most
  • Modular UPW plants for new fabs, expansions, and high-purity R&D facilities

UPW reclaim & recycling systems integrated with INFRACORP’s advanced membrane and ZLD platforms


Key Characteristics and Purity Standards

The purity of UPW is defined primarily by what it lacks. Key removal targets include:

  • Ions: Cations (e.g., sodium, calcium, iron) and anions (e.g., chloride, sulfate) are reduced to levels often below 1 part per billion (ppb) and sometimes down to parts per trillion (ppt). Purity is measured via resistivity, which can reach 18.2 MΩ·cmat 25°C, the theoretical maximum for water.
  • Organic Particles: Total Organic Carbon (TOC) is minimized, typically to <1–5 ppb, preventing interference with sensitive processes.
  • Particles and Colloids: Microscopic particles, including silica, are removed to avoid defects and contamination.
  • Bacteria and Endotoxins: All microbial life and pyrogenic byproducts are eliminated to ensure biological sterility.
  • Dissolved Gases: Oxygen, carbon dioxide, and other gases are removed to prevent chemical and process interference.

Producing UPW requires multiple, complementary purification technologies:

    1. Pretreatment: Standard filtration, softening, and reverse osmosis (RO) remove the bulk of impurities.
    2. Primary Purification:
      • Reverse Osmosis (RO): Removes ~99% of dissolved ions and organics.
      • Selective Electrodeionization (SEDI): A continuous, chemical-free polishing process that removes remaining ionic contaminants with higher selectivity and efficiency than conventional EDI.
      • Ion Exchange (IonEx): Often used in combination with SEDI for final polishing or as a backup polishing step. Mixed-bed IonEx removes trace ions that persist after RO and SEDI, achieving ultimate resistivity and purity.
    3. Final Polishing:
      • Ultraviolet (UV) Oxidation: Breaks down trace organics (TOC reduction) and sterilizes water.
      • Ultrafiltration: Removes residual particles, colloids, and bacteria.
      • Polishing Mixed-Bed Ion Exchange (IonEx): Optional but sometimes applied to guarantee the 18.2 MΩ·cm resistivity target, removing the last residual ions.

Ultrapure water is far more than “very clean water.” It is a critically engineered, high-value material that enables advanced manufacturing and precise scientific research. From semiconductors to life-saving pharmaceuticals, UPW underpins the technologies and processes that define modern life. Technologies like Selective Electrodeionization (SEDI) and Ion Exchange (IonEx) play a crucial role in achieving this unmatched purity, making UPW one of the most controlled and essential substances in industry.

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